Imec EUV Mask Cleaning Program On Track Towards EUV Mass Manufacturing

Written on 15 Jul, 2010 at 15:58 in Research | viewed 1,185 times | 0 Comments

Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield. The research program was initiated in collaboration with mask cleaning experts of HamaTech... (Continue reading)