Posts Tagged ‘IBM’

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Edwards appoint new European general manager to support growth

Edwards appoint new European general manager to support growth

Leading vacuum technology company Edwards has appointed Wolfgang Binder as General Manager for Europe to lead the company’s growth in the European semiconductor, solar and general vacuum markets. He will be responsible for European sales, service and the development of... (Continue reading)

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NYS Center of Excellence in Nanoelectronics and Nanotechnology at UAlbany NanoCollege Wins 2010 CBC Prize for Public Service Innovation

NYS Center of Excellence in Nanoelectronics and Nanotechnology at UAlbany NanoCollege Wins 2010 CBC Prize for Public Service Innovation

The Citizens Budget Commission (CBC) today announced that the winner of its 2010 CBC Prize for Public Service Innovation is the New York State Center of Excellence in Nanoelectronics and Nanotechnology (CENN) at the College of Nanoscale Science and Engineering... (Continue reading)

Workshop on Plasma Etch and Strip in Microelectronics Set for March 4-5 at MINATEC

Workshop on Plasma Etch and Strip in Microelectronics Set for March 4-5 at MINATEC

The PESM2010 workshop, which will explore recent advances in etching and stripping processes for nanoelectronics technologies, presents a unique opportunity to meet with an international gathering of researchers in the field of plasma etch and strip. The program includes presentations on... (Continue reading)

SEMATECH Kicks Off Consortium at UAlbany NanoCollege to Develop Crucial EUV Metrology Tools

SEMATECH Kicks Off Consortium at UAlbany NanoCollege to Develop Crucial EUV Metrology Tools

SEMATECH has launched a global consortium at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex to develop critical metrology tools for detecting defects in advanced masks needed for extreme ultraviolet lithography (EUVL) – filling an industry need... (Continue reading)

Research at UAlbany NanoCollege contributes to over 40 technical papers at leading lithography conference

Research at UAlbany NanoCollege contributes to over 40 technical papers at leading lithography conference

nnovative research conducted at the College of Nanoscale Science and Engineering’s (”CNSE”) Albany NanoTech (”ANT”) Complex provides the basis for more than 40 scientific and technical papers to be presented next week at one of the world’s leading conferences focused... (Continue reading)

Workshop on plasma etch and strip in microelectronics set for March 4-5 at MINATEC

Workshop on plasma etch and strip in microelectronics set for March 4-5 at MINATEC

Leti, in collaboration with CNRS/LTM, STMicroelectronics and IMEC, is organizing the 3rd Plasma Etch and Strip in Microelectronics workshop March 4-5 at MINATEC in Grenoble. The PESM2010 workshop, which will explore recent advances in etching and stripping processes for nanoelectronics technologies,... (Continue reading)

Novellus systems, IBM and the UAlbany NanoCollege Establish Strategic Partnership at CNSE’s Albany NanoTech complex

Novellus systems, IBM and the UAlbany NanoCollege Establish Strategic Partnership at CNSE’s Albany NanoTech complex

Novellus Systems (NASDAQ: NVLS), IBM Corporation (NYSE: IBM) and the College of Nanoscale Science and Engineering (CNSE) today announced the establishment of a strategic partnership at CNSE’s Albany NanoTech Complex targeting the development of semiconductor process solutions for 22nm and... (Continue reading)

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Rice celebrates the Year of Nano

Rice celebrates the Year of Nano

In the quarter century since five men had their “Aha!” moment in Houston, the buckminsterfullerene molecule has become the vanguard of a revolution. Nanotechnology is already changing life on Planet Earth, and its potential is only beginning to be realized. On... (Continue reading)

Dow Electronic Materials Joins SEMATECH’s Resist Materials and Development Center at UAlbany NanoCollege

Dow Electronic Materials Joins SEMATECH’s Resist Materials and Development Center at UAlbany NanoCollege

SEMATECH, a global consortium of chipmakers, and Dow Electronic Materials announced today that Dow has joined SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. To advance the development... (Continue reading)

European collaboration breakthrough in developing graphene

European collaboration breakthrough in developing graphene

Graphene has long shown potential, but has previously only been produced on a very small scale, limiting how well it could be measured, understood and developed. A paper published in Nature Nanotechnology explains how researchers have, for the first time,... (Continue reading)

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