Posts Tagged ‘EUV’

Imec EUV Mask Cleaning Program On Track Towards EUV Mass Manufacturing

Imec EUV Mask Cleaning Program On Track Towards EUV Mass Manufacturing

Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield. The research program was initiated in collaboration with mask cleaning experts of HamaTech... (Continue reading)

Imec inaugurates first phase in its high-tech pole expansion

Imec inaugurates first phase in its high-tech pole expansion

mec today officially opens the extension of its state-of-the-art cleanroom at its campus in Leuven, Belgium. Moreover, imec also kicks off the construction of a new office building fitting in its plan for further expanding its high-tech ecosystem. With these... (Continue reading)

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Sematech and AZ Electronic Materials to devise EUV resists

Sematech and AZ Electronic Materials to devise EUV resists

Chip-making consortium Sematech and AZ Electronic Materials have announced that AZ Electronic Materials has joined Sematech’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany, N.Y. AZ Electronic Materials will... (Continue reading)

JSR Joins SEMATECH’s Resist Center at UAlbany NanoCollege

JSR Joins SEMATECH’s Resist Center at UAlbany NanoCollege

SEMATECH, a global consortium of chipmakers, and JSR Corporation, an advanced materials supplier to chip-makers and others, and its U.S. operation, JSR Micro, Inc. announced today that it has become the newest member of SEMATECH’s Resist Materials and Development Center... (Continue reading)

SEMATECH Litho Forum to Focus on Affordable Innovation in Chip Industry

SEMATECH Litho Forum to Focus on Affordable Innovation in Chip Industry

Rep. Paul Tonko (D-NY) and ranking leaders in the semiconductor industry—including Jim Clifford, senior vice president and general manager of operations at Qualcomm, and Dr. Jack Sun, vice president of research and development at TSMC—will focus on economic challenges in... (Continue reading)

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SEMATECH Kicks Off Consortium at UAlbany NanoCollege to Develop Crucial EUV Metrology Tools

SEMATECH Kicks Off Consortium at UAlbany NanoCollege to Develop Crucial EUV Metrology Tools

SEMATECH has launched a global consortium at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex to develop critical metrology tools for detecting defects in advanced masks needed for extreme ultraviolet lithography (EUVL) – filling an industry need... (Continue reading)

HamaTech APE Completes Initial Stage of EUV Mask Cleaning Program at imec

HamaTech APE Completes Initial Stage of EUV Mask Cleaning Program at imec

HamaTech APE, a SUSS MicroTec company, today announced that it has completed the initial stage of the Extreme Ultraviolet (EUV) Mask Cleaning Program in partnership with imec, a world-leading nanoelectronics research center. With the installation of HamaTech’s MaskTrack Pro, imec’s... (Continue reading)

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Research at UAlbany NanoCollege contributes to over 40 technical papers at leading lithography conference

Research at UAlbany NanoCollege contributes to over 40 technical papers at leading lithography conference

nnovative research conducted at the College of Nanoscale Science and Engineering’s (”CNSE”) Albany NanoTech (”ANT”) Complex provides the basis for more than 40 scientific and technical papers to be presented next week at one of the world’s leading conferences focused... (Continue reading)